Institute of Shanghai Advanced Silicon Technology

Shanghai Super Silicon Research Institute is located in Songjiang Economic and Technological Development Zone, which is the leading area of G60 Science and Technology Innovation Corridor, an important supporting region of Shanghai Science and Technology Innovation Center, and an advanced manufacturing highland radiating the Yangtze River Delta. There are many high-tech enterprises around the site, and the industrial foundation is strong. With a total construction scale of about 180,000 square meters, the Shanghai Super Silicon Research Institute project has great strategic significance in filling the gap of large-size silicon wafer research and development and promoting the development of domestic integrated circuit industry.



The design takes full account of the corporate culture, adopts the design concept of "everything starts from the center, forming a unique world", and takes the deconstruction of "申" as the planning framework, forming a spatial layout of three horizontal, two vertical and one axis. As for the three-dimensional functional planning, a super-large span square ring with a circumference of more than 600 meters is held above low-rise buildings, implying "silicon crown".



The three-dimensional space design releases a large amount of ground space, bringing the green and lush elegant environment, and the ground green space and overhead green space are also increased. The sunken courtyard, indoor courtyard and roof greening also pay attention to the setting of a large number of green plants in multiple levels and dimensions to achieve integration with the natural environment and create a comprehensive green ecological scientific research office space. The functions involve scientific research experiment, conference training, administrative office, supporting services, and the classification of 8 vertical traffic cores can effectively ensure the daily operation and personnel management and interaction.